After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...
Released every 12 to 18 months, 3D NAND scaling outpaces most other semiconductor devices in replacement rate and performance ...
In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
Advances in materials happen frequently in breakthrough medical device development, but many of the same manufacturing processes have been used for decades to create components. Recently, a new way to ...
Amid the global artificial intelligence (AI) boom, semiconductor equipment companies are also reaping benefits as big tech firms thrive. A company with a dominant position in high-difficulty core ...
A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...
Plasma etching is a cornerstone technique in semiconductor fabrication, enabling the precise removal of material layers through the use of ionised gases. This process is essential for fabricating ...
Major processes in semiconductor wafer fabrication: 1) wafer preparation, 2) pattern transfer, 3) doping, 4) deposition, 5) etching, and 6) packaging. The process of creating semiconductors can be ...
FREMONT, Calif., April 16, 2025 /PRNewswire/ -- Lam Research Corp. (LRCX) (Nasdaq: LRCX) today announced the donation of its innovative multi-chamber semiconductor etching system to the Marvell ...